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Home » Gas Abatement for Semiconductor Processing
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Gas Abatement for Semiconductor Processing

July 1, 2007
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BOC Edwards
The Helios 6 gas abatement solution is an exhaust gas abatement product for high-hydrogen flow processes such as Si and SiGe epitaxy, LPCVD tungsten, and compound semiconductor MOCVD. With six inlets for process gases, plus an additional inlet for gas box purges or other ancillary operations, the gas abatement solution is based on the company’s unique inward-fired combustion technology.
Wilmington, Mass. (408) 224-4024
www.bocedwards.com

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