The Miscellaneous Organic NESHAP (MON) Rule has now hit the Chemical Industry, affecting manufactures of organic chemicals in batch or continuous process. Any HAP emission over 5 tons per year that is not addressed by previous MACT regulation must now be controlled. The deadline of November 2006 for installation and start-up of VOC/HAP controls with 98-percent destruction level and nearly 100-percent abatement up time is required under the new regulations. processes that will be affected include batch chemical process vents, continuous process vents, solvent storage vents, and waste water treatment vents.

A presentation at this year's Chem Show, held Nov. 1-3 in New York, by Milwaukee-based Anguil Environmental Systems (Booth No. 2630) will showcase three technologies currently in operation on similar applications and their related advantages: a 30,000-SCFM three chamber RTO and downstream acid gas scrubber for 99.5-percent VOC/HAP oxidation and HCl removal, a 35,000-SCFM two-chamber RTO and downstream acid gas scrubber for 98-percent VOC/HAP oxidation and 99-percent HCl removal, and a 1,500-SCFM recuperative thermal oxidizer and scrubber for 99.5-perecent VOC/HAP oxidation and 99-percent HCl and Cl₂ removal. Visit www.chemshow.com/education/safety.php#consultants.