Pollution Engineering Magazine
  Home
  Subscribe
  Subscription Customer Service
  Online
  eNewsletters
  ePE-TV
  Weekly Podcast
  Calendar
  Webinars
  Showrooms
  Current Issue
  Cover Story
  Features
  Columns
  Industry News
  Products
  Products of the Month
  Resources
  Archives
  Digital Edition Archives
  Buyers Guide
  Classified Ads
  Industry Links
  Market Research
  Career Center
  2010 Software Vendor Listing Form
  Resource Guide
  White Papers
  Media Kit
  PE Info
  Special Collections
Search in: EditorialProductsCompanies
Gas Abatement for Semiconductor Processing

July 1, 2007

ARTICLE TOOLS
EmailEmailPrintPrintReprintsReprintsshareShare



BOC Edwards
The Helios 6 gas abatement solution is an exhaust gas abatement product for high-hydrogen flow processes such as Si and SiGe epitaxy, LPCVD tungsten, and compound semiconductor MOCVD. With six inlets for process gases, plus an additional inlet for gas box purges or other ancillary operations, the gas abatement solution is based on the company’s unique inward-fired combustion technology.
Wilmington, Mass. (408) 224-4024
www.bocedwards.com


Links

|PrintEmail

Did you enjoy this article? Click here to subscribe to the magazine.



























BNP Media
© 2010 BNP Media. All rights reserved. | Privacy Policy